Indium-silicon co-doping effects in LEC — Grown gallium arsenide crystals
Identifieur interne : 000583 ( Main/Exploration ); précédent : 000582; suivant : 000584Indium-silicon co-doping effects in LEC — Grown gallium arsenide crystals
Auteurs : RBID : ISTEX:12242_1987_Article_BF03155905.pdfAbstract
In this paper we report the simultaneous (Si-In) doping in LEC grown GaAs crystals. The experimental results have shown that the double doping with Si (below 8317 electr./cm3) and In (around 4E19/cm3 in the melt) makes it possible to grow GaAs ingots fully single and with a remarkable tendency to lower the etch-pits density down to about 5E2-5E3/cm2 in large portions of the crystals.
DOI: 10.1007/BF03155905
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<author><name>V. Rakovics</name>
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<author><name>R. Fornari</name>
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<author><name>C. Paorici</name>
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<author><name>L. Zanotti</name>
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<author><name>C. Mucchino</name>
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<front><div type="abstract" xml:lang="eng">In this paper we report the simultaneous (Si-In) doping in LEC grown GaAs crystals. The experimental results have shown that the double doping with Si (below 8317 electr./cm3) and In (around 4E19/cm3 in the melt) makes it possible to grow GaAs ingots fully single and with a remarkable tendency to lower the etch-pits density down to about 5E2-5E3/cm2 in large portions of the crystals.</div>
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<abstract lang="eng">In this paper we report the simultaneous (Si-In) doping in LEC grown GaAs crystals. The experimental results have shown that the double doping with Si (below 8317 electr./cm3) and In (around 4E19/cm3 in the melt) makes it possible to grow GaAs ingots fully single and with a remarkable tendency to lower the etch-pits density down to about 5E2-5E3/cm2 in large portions of the crystals.</abstract>
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